JPH0121091B2 - - Google Patents
Info
- Publication number
- JPH0121091B2 JPH0121091B2 JP59034249A JP3424984A JPH0121091B2 JP H0121091 B2 JPH0121091 B2 JP H0121091B2 JP 59034249 A JP59034249 A JP 59034249A JP 3424984 A JP3424984 A JP 3424984A JP H0121091 B2 JPH0121091 B2 JP H0121091B2
- Authority
- JP
- Japan
- Prior art keywords
- silica
- purity
- alkali silicate
- producing high
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3424984A JPS60180911A (ja) | 1984-02-27 | 1984-02-27 | 高純度シリカおよびその製造法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3424984A JPS60180911A (ja) | 1984-02-27 | 1984-02-27 | 高純度シリカおよびその製造法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60180911A JPS60180911A (ja) | 1985-09-14 |
JPH0121091B2 true JPH0121091B2 (en]) | 1989-04-19 |
Family
ID=12408891
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3424984A Granted JPS60180911A (ja) | 1984-02-27 | 1984-02-27 | 高純度シリカおよびその製造法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60180911A (en]) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1271307A (en) * | 1985-06-27 | 1990-07-10 | Iwao Ohshima | Process for manufacturing high purity silica |
KR100651243B1 (ko) | 2005-03-04 | 2006-11-30 | (주) 에스오씨 | 구형 실리카의 제조 방법 |
WO2010068430A2 (en) * | 2008-11-25 | 2010-06-17 | The Procter & Gamble Company | Oral care compositions with fused silica |
CN105263860B (zh) * | 2013-05-20 | 2017-06-27 | 日产化学工业株式会社 | 硅溶胶以及含二氧化硅的环氧树脂组合物 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS554952A (en) * | 1978-06-28 | 1980-01-14 | Toshiba Corp | Semiconductor device |
JPS54141569A (en) * | 1978-04-26 | 1979-11-02 | Toshiba Corp | Semiconductor device |
CS208879B1 (en) * | 1979-07-09 | 1981-10-30 | Ivan Novak | Preparation method of silicic acid xerogel with high volumen of pores |
JPS5610947A (en) * | 1979-07-10 | 1981-02-03 | Toshiba Corp | Semiconductor sealing resin composition |
JPS56116647A (en) * | 1980-02-20 | 1981-09-12 | Hitachi Ltd | Manufacturing of silica-alumina type filler for semiconductor memory element covering resin |
JPS57195151A (en) * | 1981-05-27 | 1982-11-30 | Denki Kagaku Kogyo Kk | Low-radioactive resin composition |
JPS57212224A (en) * | 1981-06-24 | 1982-12-27 | Nitto Electric Ind Co Ltd | Epoxy resin composition for encapsulation of semiconductor |
JPS58145613A (ja) * | 1982-02-15 | 1983-08-30 | Denki Kagaku Kogyo Kk | 溶融シリカ球状体、その製造法およびその装置 |
JPS58151318A (ja) * | 1982-02-26 | 1983-09-08 | Shin Etsu Chem Co Ltd | 合成シリカおよびこれを含有してなる電子部品封止用樹脂組成物 |
JPS5954632A (ja) * | 1982-09-21 | 1984-03-29 | Mitsubishi Metal Corp | 石英ガラス粉末の製造法 |
-
1984
- 1984-02-27 JP JP3424984A patent/JPS60180911A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60180911A (ja) | 1985-09-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |